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Cathodoluminescence study of the excitons localization in AlGaN/GaN and InGaN/GaN quantum wells grown on sapphire

Identifieur interne : 00D942 ( Main/Repository ); précédent : 00D941; suivant : 00D943

Cathodoluminescence study of the excitons localization in AlGaN/GaN and InGaN/GaN quantum wells grown on sapphire

Auteurs : RBID : Pascal:03-0059162

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English descriptors

Abstract

Al0.1Ga0.9N(5nm)/GaN(2nm) and In0.2Ga0.8N/GaN quantum wells (QWs) grown on GaN/sapphire have been studied by cathodoluminescence (CL) spectroscopy and imaged using an experimental setup especially developed for scanning near-field CL microscopy, which combines a scanning force microscope and a scanning electron microscope. The CL spectra show the characteristic band edge emission peak of GaN at λ = 364 nm and the emission peaks related to the presence of QWs, at λ = 353 and 430 nm for the AlGaN/GaN and the InGaN/GaN samples, respectively. Monochromatic CL images reveal that the emission of the AlGaN/GaN and InGaN/GaN QWs is localized at the level of the grains observed by SFM. A cross sectional analysis of the InGaN/GaN sample gives insight into its growth and an estimation of the exciton diffusion length of about L = 180 nm.

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Pascal:03-0059162

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<title xml:lang="en" level="a">Cathodoluminescence study of the excitons localization in AlGaN/GaN and InGaN/GaN quantum wells grown on sapphire</title>
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<name sortKey="Bubendorff, J L" uniqKey="Bubendorff J">J. L. Bubendorff</name>
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<s1>Université de Reims, UFR Sciences, UTAP-LMET, EA 2061, 21, Rue Clément Ader</s1>
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<name sortKey="Grandjean, N" uniqKey="Grandjean N">N. Grandjean</name>
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<name sortKey="Troyon, M" uniqKey="Troyon M">M. Troyon</name>
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<s1>Université de Reims, UFR Sciences, UTAP-LMET, EA 2061, 21, Rue Clément Ader</s1>
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<idno type="ISSN">0022-0248</idno>
<title level="j" type="abbreviated">J. cryst. growth</title>
<title level="j" type="main">Journal of crystal growth</title>
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<term>Aluminium nitrides</term>
<term>Cathodoluminescence</term>
<term>Crystal growth from vapors</term>
<term>Epitaxial layers</term>
<term>Excitons</term>
<term>Experimental study</term>
<term>Force microscopy</term>
<term>Gallium nitrides</term>
<term>III-V semiconductors</term>
<term>Indium nitrides</term>
<term>Molecular beam epitaxy</term>
<term>Quantum wells</term>
<term>Scanning electron microscopy</term>
<term>Scanning microscope</term>
<term>Thin films</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr">
<term>Etude expérimentale</term>
<term>Croissance cristalline en phase vapeur</term>
<term>Epitaxie jet moléculaire</term>
<term>Couche épitaxique</term>
<term>Puits quantique</term>
<term>Semiconducteur III-V</term>
<term>Aluminium nitrure</term>
<term>Gallium nitrure</term>
<term>Indium nitrure</term>
<term>Exciton</term>
<term>Cathodoluminescence</term>
<term>Couche mince</term>
<term>Microscopie électronique balayage</term>
<term>Microscope balayage</term>
<term>Microscopie force</term>
<term>InGaN</term>
<term>Ga In N</term>
<term>Substrat saphir</term>
<term>7860H</term>
<term>8115H</term>
<term>AlGaN</term>
<term>Al Ga N</term>
<term>GaN</term>
<term>Ga N</term>
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<front>
<div type="abstract" xml:lang="en">Al
<sub>0.1</sub>
Ga
<sub>0.9</sub>
N(5nm)/GaN(2nm) and In
<sub>0.2</sub>
Ga
<sub>0.8</sub>
N/GaN quantum wells (QWs) grown on GaN/sapphire have been studied by cathodoluminescence (CL) spectroscopy and imaged using an experimental setup especially developed for scanning near-field CL microscopy, which combines a scanning force microscope and a scanning electron microscope. The CL spectra show the characteristic band edge emission peak of GaN at λ = 364 nm and the emission peaks related to the presence of QWs, at λ = 353 and 430 nm for the AlGaN/GaN and the InGaN/GaN samples, respectively. Monochromatic CL images reveal that the emission of the AlGaN/GaN and InGaN/GaN QWs is localized at the level of the grains observed by SFM. A cross sectional analysis of the InGaN/GaN sample gives insight into its growth and an estimation of the exciton diffusion length of about L = 180 nm.</div>
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<s1>BUBENDORFF (J. L.)</s1>
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<s1>Université de Reims, UFR Sciences, UTAP-LMET, EA 2061, 21, Rue Clément Ader</s1>
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<sZ>1 aut.</sZ>
<sZ>4 aut.</sZ>
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<s0>Al
<sub>0.1</sub>
Ga
<sub>0.9</sub>
N(5nm)/GaN(2nm) and In
<sub>0.2</sub>
Ga
<sub>0.8</sub>
N/GaN quantum wells (QWs) grown on GaN/sapphire have been studied by cathodoluminescence (CL) spectroscopy and imaged using an experimental setup especially developed for scanning near-field CL microscopy, which combines a scanning force microscope and a scanning electron microscope. The CL spectra show the characteristic band edge emission peak of GaN at λ = 364 nm and the emission peaks related to the presence of QWs, at λ = 353 and 430 nm for the AlGaN/GaN and the InGaN/GaN samples, respectively. Monochromatic CL images reveal that the emission of the AlGaN/GaN and InGaN/GaN QWs is localized at the level of the grains observed by SFM. A cross sectional analysis of the InGaN/GaN sample gives insight into its growth and an estimation of the exciton diffusion length of about L = 180 nm.</s0>
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<s5>01</s5>
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<s5>03</s5>
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<s5>04</s5>
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<s5>04</s5>
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<s0>Puits quantique</s0>
<s5>05</s5>
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<s5>05</s5>
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<s5>08</s5>
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<s5>09</s5>
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<s5>10</s5>
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<s5>10</s5>
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<s0>Indium nitrure</s0>
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<s5>11</s5>
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<s0>Indium nitrides</s0>
<s2>NK</s2>
<s5>11</s5>
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<s5>12</s5>
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<s5>13</s5>
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<s5>14</s5>
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<s5>14</s5>
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<s5>15</s5>
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<s5>15</s5>
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<s5>16</s5>
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<s5>16</s5>
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<s5>16</s5>
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<s5>17</s5>
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<s5>17</s5>
</fC03>
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<s0>Microscopía fuerza</s0>
<s5>17</s5>
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<s0>InGaN</s0>
<s4>INC</s4>
<s5>52</s5>
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<s0>Ga In N</s0>
<s4>INC</s4>
<s5>53</s5>
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<s0>Substrat saphir</s0>
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<s5>54</s5>
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<s0>7860H</s0>
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<s5>56</s5>
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<s0>8115H</s0>
<s2>PAC</s2>
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<s5>57</s5>
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<s0>AlGaN</s0>
<s4>INC</s4>
<s5>92</s5>
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<fC03 i1="22" i2="3" l="FRE">
<s0>Al Ga N</s0>
<s4>INC</s4>
<s5>93</s5>
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<fC03 i1="23" i2="3" l="FRE">
<s0>GaN</s0>
<s4>INC</s4>
<s5>94</s5>
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<s5>95</s5>
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<s5>06</s5>
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<s0>Nitrure</s0>
<s2>NA</s2>
<s5>07</s5>
</fC07>
<fC07 i1="02" i2="3" l="ENG">
<s0>Nitrides</s0>
<s2>NA</s2>
<s5>07</s5>
</fC07>
<fN21>
<s1>034</s1>
</fN21>
<fN82>
<s1>PSI</s1>
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